A simple method producing shadow masks used in electrical characterization techniques

COŞKUN C., Efeoglu H.

INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, cilt.46, sa.3, ss.410-412, 2003 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 46 Sayı: 3
  • Basım Tarihi: 2003
  • Doi Numarası: 10.1023/a:1024443228073
  • Dergi Adı: INSTRUMENTS AND EXPERIMENTAL TECHNIQUES
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Sayfa Sayıları: ss.410-412
  • Atatürk Üniversitesi Adresli: Evet

Özet

In this paper, a novel technique is introduced to make a shadow mask (SM) that is used in various electrical characterization techniques such as Hall-resistivity, magnetoresistance, and TLM (Transmission Line Method) ohmic contact measurements. By using this technology, a film thickness of about 0.25-0.30 mum was obtained after photoprocessing. We reached an SM thickness of 15-20 mum by electrodeposition, which is required for a sufficiently high toughness. It was observed that the sharpness of the masks was also fairly good. The SMs obtained using this technology have been successfully used in various applications.