Çiçek, H. Et Al. 2014. The Effect of Pulse and Bias DC Voltage on Crystallization of TiNi Shape Memory Thin Films Deposited by Unbalanced Magnetron Sputtering. ICMCTF14, 41th Int. Conf. on Metallurgical Coatings and Thin Films , (San Diago, United States Of America).

Çiçek, H., EFEOĞLU, İ., Baran, Ö., & TOTİK, Y., (2014). The Effect of Pulse and Bias DC Voltage on Crystallization of TiNi Shape Memory Thin Films Deposited by Unbalanced Magnetron Sputtering . ICMCTF14, 41th Int. Conf. on Metallurgical Coatings and Thin Films, San Diago, United States Of America

Çiçek, Hikmet Et Al. "The Effect of Pulse and Bias DC Voltage on Crystallization of TiNi Shape Memory Thin Films Deposited by Unbalanced Magnetron Sputtering," ICMCTF14, 41th Int. Conf. on Metallurgical Coatings and Thin Films, San Diago, United States Of America, 2014

Çiçek, Hikmet Et Al. "The Effect of Pulse and Bias DC Voltage on Crystallization of TiNi Shape Memory Thin Films Deposited by Unbalanced Magnetron Sputtering." ICMCTF14, 41th Int. Conf. on Metallurgical Coatings and Thin Films , San Diago, United States Of America, 2014

Çiçek, H. Et Al. (2014) . "The Effect of Pulse and Bias DC Voltage on Crystallization of TiNi Shape Memory Thin Films Deposited by Unbalanced Magnetron Sputtering." ICMCTF14, 41th Int. Conf. on Metallurgical Coatings and Thin Films , San Diago, United States Of America.

@conferencepaper{conferencepaper, author={Hikmet Çiçek Et Al. }, title={The Effect of Pulse and Bias DC Voltage on Crystallization of TiNi Shape Memory Thin Films Deposited by Unbalanced Magnetron Sputtering}, congress name={ICMCTF14, 41th Int. Conf. on Metallurgical Coatings and Thin Films}, city={San Diago}, country={United States Of America}, year={2014}}