CAKMAK, B. Et Al. 2010. Fabrication of highly reflective gratings in 1.5 μm semiconductor lasers using focused ion beam-based etching. Microelectronic Engineering , vol.87, no.11 , 2343-2347.

CAKMAK, B., KARACALI, T., REN, Z., & YU, S., (2010). Fabrication of highly reflective gratings in 1.5 μm semiconductor lasers using focused ion beam-based etching. Microelectronic Engineering , vol.87, no.11, 2343-2347.

CAKMAK, Bülent Et Al. "Fabrication of highly reflective gratings in 1.5 μm semiconductor lasers using focused ion beam-based etching," Microelectronic Engineering , vol.87, no.11, 2343-2347, 2010

CAKMAK, Bülent Et Al. "Fabrication of highly reflective gratings in 1.5 μm semiconductor lasers using focused ion beam-based etching." Microelectronic Engineering , vol.87, no.11, pp.2343-2347, 2010

CAKMAK, B. Et Al. (2010) . "Fabrication of highly reflective gratings in 1.5 μm semiconductor lasers using focused ion beam-based etching." Microelectronic Engineering , vol.87, no.11, pp.2343-2347.

@article{article, author={Bülent ÇAKMAK Et Al. }, title={Fabrication of highly reflective gratings in 1.5 μm semiconductor lasers using focused ion beam-based etching}, journal={Microelectronic Engineering}, year=2010, pages={2343-2347} }