An investigation of control mechanisms of the excitonic behavior in reactively sputtered ZnO on (0001) Al2O3


TUZEMEN S. , Gur E. , YILDIRIM T., XIONG G., WILLIAMS R. T.

JOURNAL OF APPLIED PHYSICS, vol.100, no.10, 2006 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 100 Issue: 10
  • Publication Date: 2006
  • Doi Number: 10.1063/1.2386926
  • Title of Journal : JOURNAL OF APPLIED PHYSICS

Abstract

Above-band-edge absorption spectra of reactively sputtered Zn- and O-rich samples exhibit free exciton and neutral acceptor bound exciton (A(0)X) features. It is shown that the residual acceptors which bind excitons with an energy of 75 meV reside about 312 meV above the valence band, according to effective mass theory. An intra-band-gap absorption feature peaking at 2.5 eV shows correlation with the characteristically narrow A-free exciton peak intensity, suggesting a compensation mechanism of the centers involving oxygen vacancy (V-O) related donors. In order to enhance free exciton concentration relative to competing neutral bound exciton density, relevant annealing processes are performed without disturbing the residual shallow acceptor profile which is necessary for at least background p-type conductivity. (c) 2006 American Institute of Physics.