The effect of bias voltage and working pressure on S/Mo ratio at MoS2-Ti composite films

BULBUL F., Efeoglu I., Arslan E.

APPLIED SURFACE SCIENCE, cilt.253, sa.9, ss.4415-4419, 2007 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 253 Sayı: 9
  • Basım Tarihi: 2007
  • Doi Numarası: 10.1016/j.apsusc.2006.09.059
  • Dergi Adı: APPLIED SURFACE SCIENCE
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Sayfa Sayıları: ss.4415-4419
  • Anahtar Kelimeler: MoS2-Ti, bias, working pressure, sputtering, S/Mo, CRYSTALLOGRAPHIC ORIENTATION, TRIBOLOGICAL PROPERTIES, COATINGS, WEAR, LUBRICATION, FRICTION
  • Atatürk Üniversitesi Adresli: Evet

Özet

S/Mo ratio has a crucial effect on the tribological properties of MoS2-Ti composite films. The deposition parameters as such bias voltage and working pressure play a dominant role on the change of this ratio value. To determine the effect of working pressure and bias voltage on S/Mo ratio, MoS2-Ti composite films were deposited on glass wafers by pulsed-dc magnetron sputtering (PMS). The deposition process was performed for nine different test conditions at various levels of target current, working pressure, and substrate voltage using the Taguchi L-9(3(4)) experimental method. It was observed that the chemical composition of MoS2-Ti composite films was significantly affected by sputtering parameters. It was also observed that S/Mo ratio decreased as the bias voltage increased at a constant working pressure and S/Mo ratio increased with increasing working pressure at a constant bias voltage. (c) 2006 Elsevier B.V. All rights reserved.