International Syposium on Applied Sciences and Engineering, Erzurum, Türkiye, 26 - 28 Kasım 2018
Thin films of titanium dioxide (TiO2) are extensively studied because of their interesting chemical, electrical and optical properties. These kind of materials can be used as an anti-reflective and protective coating on optical elements, and as a protective layer for very large scale integrated circuits due to their high refractive index, excellent optical transmittance and good insulating properties. Optical properties of TiO2 include a wide electron energy band gap, transparency throughout the visible spectrum and a high refractive index over a wide spectral range from the ultraviolet to the far infrared. In the past decade, the fabrication of TiO2 nanostructures by electrochemical anodization of titanium, which titanium foil was used as a substrate, was investigated by many researchers and the cathodic deposition of TiO2 was available only at a limited studies. In this study, cathodic constant potential electrodeposition of TiO2 from aqueous solutions was successfully provided in 0,04 M TiOSO4, 0,1 M H2O2, and 0,5 M KNO3 solution. The characterization of TiO2 thin films was performed by XRD, XPS, EDS, and SEM techniques.