Photoelectrochemical Properties of Electrochemical Fabricated TiO2 Nanostructures


Çepni E., Gür E. P., Hosseinpour M., Öztürk Doğan H., Öznülüer T., Demir Ü.

International Syposium on Applied Sciences and Engineering, Erzurum, Türkiye, 26 - 28 Kasım 2018

  • Yayın Türü: Bildiri / Özet Bildiri
  • Basıldığı Şehir: Erzurum
  • Basıldığı Ülke: Türkiye
  • Atatürk Üniversitesi Adresli: Evet

Özet

Thin films of titanium dioxide (TiO2) are extensively studied because of their interesting chemical, electrical and optical properties. These kind of materials can be used as an anti-reflective and protective coating on optical elements, and as a protective layer for very large scale integrated circuits due to their high refractive index, excellent optical transmittance and good insulating properties. Optical properties of TiO2 include a wide electron energy band gap, transparency throughout the visible spectrum and a high refractive index over a wide spectral range from the ultraviolet to the far infrared. In the past decade, the fabrication of TiO2 nanostructures by electrochemical anodization of titanium, which titanium foil was used as a substrate, was investigated by many researchers and the cathodic deposition of TiO2 was available only at a limited studies. In this study, cathodic constant potential electrodeposition of TiO2 from aqueous solutions was successfully provided in 0,04 M TiOSO4, 0,1 M H2O2, and 0,5 M KNO3 solution. The characterization of TiO2 thin films was performed by XRD, XPS, EDS, and SEM techniques.