Effects of Annealing on Structural, Morphological, and Corrosion Properties of alpha-Fe2O3 Thin Films


Demircioglu A., ÇINAR DEMİR K.

JOURNAL OF ELECTRONIC MATERIALS, cilt.50, sa.5, ss.2750-2760, 2021 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 50 Sayı: 5
  • Basım Tarihi: 2021
  • Doi Numarası: 10.1007/s11664-021-08786-y
  • Dergi Adı: JOURNAL OF ELECTRONIC MATERIALS
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus, PASCAL, Applied Science & Technology Source, Chemical Abstracts Core, Chimica, Compendex, Computer & Applied Sciences, INSPEC
  • Sayfa Sayıları: ss.2750-2760
  • Anahtar Kelimeler: EIS, electrodeposition, Fe2O3, Raman, Tafel, XRD, SPRAY-PYROLYSIS, HEMATITE PHOTOANODES, OPTICAL-PROPERTIES, PHOTOELECTROCHEMICAL PERFORMANCE, ELECTROCHEMICAL DEPOSITION, ELECTRODEPOSITION, LAYER
  • Atatürk Üniversitesi Adresli: Evet

Özet

Hematite (Fe2O3) thin films have been synthesized on indium tin oxide (ITO)-coated glass substrate using an electrodeposition technique and the changes in their structure due to subsequent annealing at different temperatures investigated. The structural, optical, and morphological properties of Fe2O3 thin films formed after annealing at temperatures of 500 degrees C, 550 degrees C, and 600 degrees C after deposition were determined by x-ray diffraction (XRD) analysis, absorption spectroscopy, Raman spectroscopy, scanning electron microscopy (SEM), and atomic force microscopy (AFM). XRD analysis of the annealed electrodeposited samples revealed Fe2O3 thin films with rhombohedral crystal structure. The energy bandgap of the Fe2O3 films grown on ITO and annealed at different temperatures was calculated based on absorption measurements, yielding values between 2.0 eV and 2.2 eV. Raman peaks were observed between 210 cm(-1) and 1305 cm(-1) depending on the annealing temperature. SEM analysis clearly revealed the crystal structure belonging to Fe2O3 and an increase in the particle size as the annealing temperature was increased. The surface roughness values (in the range from 11 nm to 46 nm) obtained from AFM images of the samples annealed at different temperatures were compatible with the average roughness values (in the range from 14 nm to 51 nm). The results of these analyses confirm that the structure of the alpha-Fe2O3 thin films was improved by increasing the annealing temperature. Electrochemical impedance spectroscopy (EIS) and Tafel measurements enabled detailed examination of the corrosion behavior of the alpha-Fe2O3 films deposited on the ITO substrate. Nyquist and Bode analyses were applied to determine the structural changes to the Fe2O3 and its corrosion behavior. The R-s values calculated with the help of Nyquist plots increased from 65.10 ohm cm(2) to 540.5 ohm cm(2) with increase of the annealing temperature, while the R-ct values decreased from 64.29 x 10(9) ohm cm(2) to 1.142 ohm cm(2) after annealing. The corrosion current and potential parameters were also calculated from Tafel measurements after deposition and annealing at different temperatures.