The temperature induced current transport characteristics in the orthoferrite YbFeO3-delta thin film/p-type Si structure

Polat O., Coskun M., Efeoglu H., Caglar M., Coskun F. M., Caglar Y., ...Daha Fazla

JOURNAL OF PHYSICS-CONDENSED MATTER, cilt.33, sa.3, 2021 (SCI-Expanded, Scopus) identifier identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 33 Sayı: 3
  • Basım Tarihi: 2021
  • Doi Numarası: 10.1088/1361-648x/abba69
  • Dergi Adı: JOURNAL OF PHYSICS-CONDENSED MATTER
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus, Aerospace Database, Chemical Abstracts Core, Chimica, Communication Abstracts, Compendex, EMBASE, INSPEC, MEDLINE, Metadex, DIALNET, Civil Engineering Abstracts
  • Atatürk Üniversitesi Adresli: Evet

Özet

The perovskite ytterbium ferrite is a new ferroelectric semiconductor material. We presented the temperature induced current-voltage (I-V) characteristics of the Al/YbFeO3-delta/p-Si/Al hetero-junction. The orthoferrite YbFeO3-delta thin films were deposited on a single crystal p-type Si substrate by a radio frequency magnetron sputtering system. The potential barrier height (BH) and ideality factor n of the heterojunction were obtained by thermionic emission current method based on the recommendations in the literature. The fact that the calculated slopes of I-V curves become temperature independent implying that the field emission current mechanism takes place across the device, which has been explained by the presence of the spatial inhomogeneity of BHs or potential fluctuations. Moreover, a tunneling transmission coefficient value of 26.67 was obtained for the ferroelectric YbFeO3-delta layer at the Al/p-Si interface.