Characterization of Ti-CN-a:C films prepared by pulsed-dc bias sputtering


Bulbul F., EFEOĞLU İ.

PROCEEDINGS OF THE INSTITUTION OF MECHANICAL ENGINEERS PART J-JOURNAL OF ENGINEERING TRIBOLOGY, cilt.224, ss.677-684, 2010 (SCI-Expanded) identifier identifier

Özet

The incapable side of diamond-like carbon films is low adhesion, resulting from high internal stress. The incorporation of buffer layers into the coating structure to relieve stress and to allow crack energy dissipation by plastic deformation in the crack tip is an effective route for improving toughness. Although this approach will result in a partly decreased coating hardness, the gain in tribological properties is more preferred for many applications. In graded coatings, design and joining of the functional regions including sharp interfaces between layers are very important. The desirable properties can provide only through appropriate transition regions produced by using appropriate deposition methods. In this study, Ti-CN-a:C films were deposited on AISI M2 steel substrates by closed-field unbalanced magnetron sputtering using pulsed-dc biasing, and hardness, crystallography, wear, and adhesion properties of the film were investigated. Accordingly, Ti-CN-a: C films grown exhibited an increase of about 30 per cent in hardness according to that of the substrate and low (mu similar to 0.1) and stable friction and good adhesion (L-c = 43 N), whereas the crystallographic development of the film was amorphous. These properties obtained were attributed to using of CN transient layer and pulsed-dc magnetron sputtering technology.