SURFACE & COATINGS TECHNOLOGY, cilt.60, ss.525-530, 1993 (SCI-Expanded)
Amorphous hydrogenated carbon films containing a small amount of metal (Me: C-H) have been deposited by closed field unbalanced magnetron sputter ion plating. The films have graded film compositions to optimise the adhesion to the substrates, and multilayer TiC/Ti: C-H films have also been deposited. The films have excellent properties: very high measured microhardness (more than 4000 H(V)), excellent adhesion (L(c) 115-125 N), coefficients of friction against WC of less than 0.2, and volumetric wear rates one fifth that of titanium nitride. The coating procedure is ideally suited to the system used, and many applications for the films are already realised.