Temperature-dependent characteristics of Tantalum and Tantalum nitride based p-Si structures


Islam T., EFEOĞLU H., Turut A.

Materials Science in Semiconductor Processing, cilt.195, 2025 (SCI-Expanded) identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 195
  • Basım Tarihi: 2025
  • Doi Numarası: 10.1016/j.mssp.2025.109645
  • Dergi Adı: Materials Science in Semiconductor Processing
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus, Academic Search Premier, PASCAL, Applied Science & Technology Source, Chemical Abstracts Core, Chimica, Communication Abstracts, Compendex, Computer & Applied Sciences, INSPEC, Metadex
  • Atatürk Üniversitesi Adresli: Evet

Özet

We investigated the temperature-dependent current-voltage (I-V-T) characteristics data of Ta and Ta/TaN-based p-Si Schottky barrier diodes (SBDs). The Schottky barrier heights (SBH) for Ta/p-Si and Ta/TaN1-x/p-Si SBDs were obtained as 0.574 eV and 0.717 eV at 300 K, respectively. The difference between their SBHs is 0.143 eV at 300 K. At temperatures below 240 K for the Ta/TaN1-x/p-Si, more excess current than estimated by the TE model was observed at low bias voltages in the I-V curves. The excess current increased with a decrease in temperature. The phenomenon has been ascribed to the low SBH-patches embedded at the MS interface. Moreover, the thermal sensitivity V-T data were measured from 20 K up to 320 K at 2.0 K intervals under different current levels. It has been seen that the linear portion of the V-T traces of the Ta/TaN1-x/p-Si SBDs have corresponded to a wider temperature range with more thermal sensitivity coefficient α than that of the Ta/p-Si at each current level. For example, the α values of 2.573 and 2.710 mV/K at 50 nA, and 2.070 and 2.230 mV/K at 10.0 μA have been obtained for the Ta/p-Si and Ta/TaN1-x/p-Si SBDs, respectively.