Influence of films thickness and structure on the photo-response of ZnO films

YILDIRIM M. A., Ates A.

OPTICS COMMUNICATIONS, cilt.283, sa.7, ss.1370-1377, 2010 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 283 Sayı: 7
  • Basım Tarihi: 2010
  • Doi Numarası: 10.1016/j.optcom.2009.12.009
  • Dergi Adı: OPTICS COMMUNICATIONS
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Sayfa Sayıları: ss.1370-1377
  • Anahtar Kelimeler: ZnO, Annealing, Film thickness and light effect, SILAR, IONIC-LAYER ADSORPTION, CHEMICAL BATH DEPOSITION, THIN-FILMS, ELECTRICAL-PROPERTIES, ELECTRODEPOSITION
  • Atatürk Üniversitesi Adresli: Evet

Özet

ZnO thin films were grown using Successive Ionic Layer Adsorption and Reaction (SILAR) method on glass substrates at room temperature. Annealing temperatures and film thickness effect on the structural, morphological, optical and electrical properties of the films were studied. For this as-deposited films were annealed at 200, 300, 400 and 500 degrees C for 30 min in oxygen atmosphere. The X-ray diffraction (XRD) and scanning electron microscopy (SEM) studies showed that the films are covered well with glass substrates and have good polycrystalline structure and crystalline levels. The film thickness effect on band gap values was investigated and band gap values were found to be within the range of 3.49-3.19 eV. The annealing temperature and light effect on electrical properties of the films were investigated and it was found that the current increased with increasing light intensity. The resistivity values were found as 10(5) Omega-cm for as-deposited films from electrical measurements. The resistivity decreased decuple with annealing temperature and decreased centuple with light emission for annealed films. (C) 2009 Elsevier B.V. All rights reserved.