Deposition and Adhesion Characterization of Ti(BN:MoS2) Based Composite Thin Films Prepared by Closed-Field Unbalanced Magnetron Sputtering
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, cilt.25, sa.13, ss.1497-1505, 2011 (SCI-Expanded, Scopus)
- Yayın Türü: Makale / Tam Makale
- Cilt numarası: 25 Sayı: 13
- Basım Tarihi: 2011
- Doi Numarası: 10.1163/016942410x549933
- Dergi Adı: JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY
- Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
- Sayfa Sayıları: ss.1497-1505
- Anahtar Kelimeler: Deposition, magnetron sputtering, thin films, nanocomposites, adhesion, COATINGS, STRESS
- Atatürk Üniversitesi Adresli: Evet
Özet
Composite structured solid thin films were deposited on 52100 tool steel by co-sputtering from BN, TiB2, MoS2 and Ti targets using a closed-field unbalanced magnetron sputtering process (CFUBMS). The structural and mechanical properties of the composite structured coatings were investigated. The composition and morphology of the films were investigated using X-ray diffraction and scanning electron microscopy (SEM). The adhesion properties of the films were characterized by the use of a Revetest-scratch tester. The adhesion test results indicated that bias voltage was the most effective coating parameter related to the critical load. (C) Koninklijke Brill NV, Leiden, 2011