Deposition and Adhesion Characterization of Ti(BN:MoS2) Based Composite Thin Films Prepared by Closed-Field Unbalanced Magnetron Sputtering

YETIM A. F., EFEOĞLU İ., ÇELİK A., Alsaran A., Kaymaz I.

JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, cilt.25, sa.13, ss.1497-1505, 2011 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 25 Sayı: 13
  • Basım Tarihi: 2011
  • Doi Numarası: 10.1163/016942410x549933
  • Dergi Adı: JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Sayfa Sayıları: ss.1497-1505
  • Anahtar Kelimeler: Deposition, magnetron sputtering, thin films, nanocomposites, adhesion, COATINGS, STRESS
  • Atatürk Üniversitesi Adresli: Evet

Özet

Composite structured solid thin films were deposited on 52100 tool steel by co-sputtering from BN, TiB2, MoS2 and Ti targets using a closed-field unbalanced magnetron sputtering process (CFUBMS). The structural and mechanical properties of the composite structured coatings were investigated. The composition and morphology of the films were investigated using X-ray diffraction and scanning electron microscopy (SEM). The adhesion properties of the films were characterized by the use of a Revetest-scratch tester. The adhesion test results indicated that bias voltage was the most effective coating parameter related to the critical load. (C) Koninklijke Brill NV, Leiden, 2011