Deposition and Adhesion Characterization of Ti(BN:MoS2) Based Composite Thin Films Prepared by Closed-Field Unbalanced Magnetron Sputtering
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, vol.25, no.13, pp.1497-1505, 2011 (SCI-Expanded, Scopus)
- Publication Type: Article / Article
- Volume: 25 Issue: 13
- Publication Date: 2011
- Doi Number: 10.1163/016942410x549933
- Journal Name: JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY
- Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
- Page Numbers: pp.1497-1505
- Keywords: Deposition, magnetron sputtering, thin films, nanocomposites, adhesion, COATINGS, STRESS
- Ataturk University Affiliated: Yes
Abstract
Composite structured solid thin films were deposited on 52100 tool steel by co-sputtering from BN, TiB2, MoS2 and Ti targets using a closed-field unbalanced magnetron sputtering process (CFUBMS). The structural and mechanical properties of the composite structured coatings were investigated. The composition and morphology of the films were investigated using X-ray diffraction and scanning electron microscopy (SEM). The adhesion properties of the films were characterized by the use of a Revetest-scratch tester. The adhesion test results indicated that bias voltage was the most effective coating parameter related to the critical load. (C) Koninklijke Brill NV, Leiden, 2011