FABRICATION AND CHARACTERIZATION OF SILICON NITRIDE Si3N4 THIN FILMS BY PLASMA ENHANCEMENT CHEMICAL VAPOR DEPOSITION PECVD

Odabaş E., Aras G., ORHAN E., BOYDAŞ E.

World Conference on Technology, Innovation and Entrepreneurship, 28 - 30 Mayıs 2015

  • Yayın Türü: Bildiri
  • Atatürk Üniversitesi Adresli: Evet