FABRICATION AND CHARACTERIZATION OF SILICON NITRIDE Si3N4 THIN FILMS BY PLASMA ENHANCEMENT CHEMICAL VAPOR DEPOSITION PECVD

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Odabaş E., Aras G., ORHAN E., BOYDAŞ E.

World Conference on Technology, Innovation and Entrepreneurship, 28 - 30 Mayıs 2015

• Yayın Türü: Bildiri
• Atatürk Üniversitesi Adresli: Evet